Add sidewall angle to Etch process step #2703
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Hey @thomasdorch - I've reviewed your changes and they look great!
Here's what I looked at during the review
- 🟡 General issues: 1 issue found
- 🟢 Security: all looks good
- 🟢 Testing: all looks good
- 🟢 Complexity: all looks good
Help me be more useful! Please click 👍 or 👎 on each comment to tell me if it was helpful.
| @@ -158,13 +158,15 @@ class Etch(Lithography): | |||
| thickness (float): thickness to remove [nm] | |||
| type (str): of etch (isotropic, anisotropic, etc.) | |||
| rate (float): of removal [nm/s] | |||
| sidewall_angle (float): angle of sidewall [deg] | |||
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suggestion (code_clarification): Consider adding a description for the default value of sidewall_angle.
Including the default value in the documentation can help developers understand the expected behavior when the parameter is not explicitly set.
Suggested change
| sidewall_angle (float): angle of sidewall [deg] | |
| sidewall_angle (float): angle of sidewall [deg]. Default is 90 degrees. |
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