TNN7 a suite of nine highly optimized custom macros developed using a predictive 7nm Process Design Kit (PDK), to enhance the efficiency, modularity and flexibility of the TNN design framework. Macros can be referenced through the .lib and .lef files, developed using the ASAP7[] transistor model files. This work is accepted and will be presented in ISVLSI 2022.
Layout of 82x2 TNN column for UCR TwoLeadECG application using ASAP7 standard cells
Layout of 82x2 TNN column for UCR TwoLeadECG application using TNN7 custom macros
