Simple models for thin film growth using atomic layer deposition
Atomic layer deposition is a thin film growth technique that relies on self-limited surface kinetics. It plays a key role in areas such as microelectronics, and it is applied for energy, energy storage, catalysis, and decarbonization applications.
aldsim implements a series of models to help explore ALD in
various contexts and reactor configurations.
It has grown from a collection of papers that we have published over the past 10 years.
aldsim is still in development. Over the next few months it will
be expanded to incorporate a variety of models. Please check aldsim's
documentation in readthedocs.
Through pypi:
pip install aldsim
Argonne's Laboratory Directed Research and Development program
Copyright © 2024, UChicago Argonne, LLC
aldsim is distributed under the terms of BSD License.
Argonne Patent & Intellectual Property File Number: SF-24-041