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Updated CSAR AR 6200 13 (markdown)
added page
added csar
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added Photomask Fabrication
added `Inclined Photolithography of SU-8 (45 µm)`
Created AR PC 5040 Protective coating for KOH etching (markdown)
added `AR-PC 5040 Protective coating for KOH etching`
added `Etching Si with 30 wt% KOH`
moved 'Preparing 30 wt% KOH' to proper section
Created Preparing 30 wt% KOH (markdown)
Updated Home (markdown)
Updated SU 8 5um (markdown)
Updated SPR700 1um (markdown)
Revert "Destroyed AMONIL residual layer etch (markdown)" This reverts commit 554a90a681ccce611f6850b0127c5eadcb5da05a.
Updated Characterization of Graphene by Raman spectroscopy (markdown)
Created Characterization of Graphene by Raman spectroscopy (markdown)
Updated Graphene transfer from Cu substrate (markdown)
Created Graphene transfer from Cu substrate (markdown)
Updated _Sidebar (markdown)
Updated SU 8 100um (markdown)