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NTNU NanoLab Process Database

Welcome to the process database for NTNU NanoLab! Here you will find protocols written by our own users in addition to information related to the instruments and chemicals in our cleanroom. For instrument booking use LIMS.

Protocols

Photolithography

• Photomask Fabrication

• Positive resists

  • SPR700 1um
  • S1813 1.4um
  • S1813 1.9um
  • ma-P 1275 28um

• Negative resists

  • ma-N 2405 ~0.5um
  • SU-8 2um
  • SU-8 5um
  • SU-8 13um
  • SU-8 50um
  • SU-8 100um
  • Dilution of SU-8 2000-series
  • Inclined Photolithography of SU-8 (45 µm)

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Lift-off

• AZ5214E Image reversal resist
• AZ5214E lift-off with MLA
• PMMA lift-off 50-60nm feature size 110nm pitch
• Simple lift-off using ma-N 440

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Soft lithography

• PDMS replica molding
• PDMS plasma bonding

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Electron beam lithography (EBL)

• Standard Procedure for CSAR62 on Si with BEAMER PEC

• Spin curves

  • 950K PMMA A4.5 Spin curve for custom resist

• Positive resist

  • PMMA 100nm
  • PMMA 40 nm feature size 200 nm pitch
  • CSAR AR 6200 13 Anisole (0.15um)

• Negative resist

  • SU-8 EBL

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Nanoimprint lithography (NIL)

• UV-curable resist
  • AMONIL 180nm
  • Dilution of AMONIL MMS4 to AMONIL MMS10

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Etching

• Dry etch
  • Si cryogenic etch
  • Si cryogenic etch - Sub 60 nm features with PMMA mask
  • Si cryogenic etch - 70 nm holes
  • CAIBE etch of AMONIL
  • AMONIL residual layer etch
• Wet etch
  • AMONIL resist strip
  • Etching Si with 30 wt% KOH
  • AR-PC 5040 Protective coating for KOH etching
  • Preparing 30 wt% KOH

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Deposition

• Alumina mask
• Gold nano particles
• Sputtering of Si for SiO2 films
• Growth of vertically aligned Carbon Nanotubes

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Graphene Transfer

• Graphene transfer from Cu substrate

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Characterization

• Raman Spectroscopy
  • Characterization of Graphene by Raman spectroscopy