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NTNU NanoLab Process Database

Welcome to the process database for NTNU NanoLab! Here you will find protocols written by our own users in addition to information related to the instruments and chemicals in our cleanroom. For instrument booking use LIMS.

Protocols

Photolithography

• Positive resists
  • SPR700 1um
  • S1813 1.4um
  • S1813 1.9um
  • ma-P 1275 28um
• Negative resists
  • SU-8 2um
  • SU-8 5um
  • SU-8 13um
  • SU-8 50um
  • Dilution of SU-8 2000-series

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Lift-off

• AZ5214E Image reversal resist

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Soft lithography

• PDMS replica molding

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Electron beam lithography (EBL)

• Positive resist
  • PMMA 100nm
  • PMMA 40 nm feature size 200 nm pitch
• Negative resist
  • SU-8 EBL

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Nanoimprint lithography (NIL)

• UV-curable resist
  • AMONIL 180nm

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Etching

• Dry etch
  • Si cryogenic etch
• Resist strip
  • Cured AMONIL

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Deposition

• Alumina mask
• Gold nano particles